RIE dynamics for extreme wafer thinning applications
authorsRassoul, Nouredine; Jourdain, Anne; Tutunjyan, Nina; De Vos, Joeri; Sardo, Stefano; Inoue, Fumihiro; Piumi, Daniele; Beyer, Gerald; Miller, Andy; Beyne, Eric;
publicationMicroelectronic engineering
volume192
pages30-37
year2018